Автор: | Группа авторов |
Издательство: | John Wiley & Sons Limited |
Серия: | |
Жанр произведения: | Химия |
Год издания: | 0 |
isbn: | 9781119645580 |
risk for radiation damage
μ‐SRXRF
X‐rays
Multi‐element
>10 nm
1 nm
5 ppm
Yes
Very high
TXRF
X‐rays
Na‐U
>3 nm
Yes (Optional)
High
Polished surface required for best detection limits, Can analyze many substrates, e.g. Si, SiC, GaAs, InP, sapphire, glass
X‐ray fluorescence microscopy (XFM)
X‐rays
Multi‐element (Al‐U but poor 2nd row Z > 42
0.05–1 μm
>100 μm
<0.1 ppm
Yes
Medium
Upto 150 × 100
Ability for spectroscopy (XAS) to determine chemical speciation
SEM/TEM‐EDS
Electrons
Multi‐element (O‐U)
<0.5 μm
<0.5 μm
1000 ppm
Yes
Medium
7 × 7
Resolution depends on element investigated
PIXE
Protons (for biological applications)
Multi‐element (Na‐U)
2 μm
10–100 μm
1–10 ppm
Limited
Very high
4 × 4
Quantitative measurements of heavier elements that can't be resolved by RBS alone
XPS/ESCA
X‐rays
Li‐U (Chemical bonding information)
0.5 nm
3 nm
100 ppm
Yes
High
Smallest analytical area ~10 μm
Limited specific organic information and sample compatibility with UHV environment.
Auger (AES)
Electrons
Li‐U
0.2 μm
3 nm
100 ppm
Yes
High
Small area analysis (~20 nm minimum)
Analysis of insulators can be difficult and samples must be vacuum compatible.
SIMS
Ions
H‐U including isotopes
5 μm
0.1 nm
1 ppb
Yes
Medium
Small‐area analysis (1–10 μm)
Destructive,no chemical bonding information, and sample must be solid and vacuum compatible.
TOF‐SIMS
Ions
Full periodic table coverage, plus molecular species
<0.1 μm
1 nm
1 ppm
Yes
High
Samples must be vacuum compatible
RBS
He2+ Ions (alpha particles)
B‐U
2 mm
10–20 nm
1–1000 ppm
No
Medium
Large analysis area (~2 mm)
Non‐destructive, Conductor and insulator analysis
ICP‐OES
Argon plasma
Li‐U (except gases, halogens, low quantity of P and S)
No
Bulk chemical analysis technique
<1 ppb
No
Medium
No
C, H, N, O and halogens cannot be determined.
ICP‐MS
Plasma source
Most of the elements
No
No
Typically ng/ L
No
Medium
No
Polyatomic mass interferences, atmospherics and light halogens
LA‐ICP‐MS
Photos (Laser)
Multi‐element (Al‐U)
100 nm
0.1–1 μm
<1 ppb
Yes (Limited: ablated surface)
Medium
20 × 20
Elemental, stable isotope distribution analysis and mapping
LIBS
Photos (Laser)
All elements detectable
>0.1 μm
1 ppm
Yes (Limited)
Medium
Strong matrix‐effects on emission spectra
Atom Probe Tomography (APT)
Laser or voltage pulse
H‐U
<1 nm
0.3 nm
~10 ppm
Yes
High
50 × 50 nm2
Ability to identify isotopes, Cluster analysis for nanoscale precipitates
STEM
Electrons
B‐U (EDS)
3 nm
3 nm
Typically ppm
Yes
High
5 μm x 5 μm