Atomic Layer Deposition. Principles, Characteristics, and Nanotechnology Applications - David Cameron
| Автор: | David Cameron |
| Издательство: | John Wiley & Sons Limited |
| Серия: | |
| Жанр произведения: | Зарубежная образовательная литература |
| Год издания: | 0 |
| isbn: | 9781118747421 |
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.